The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Jan. 28, 2022
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Ishtak Karim, San Jose, CA (US);
Kiyong Cho, Edmonds, OR (US);
Adrien LaVoie, Newberg, OR (US);
Jaswinder Guliani, Beaverton, OR (US);
Purushottam Kumar, Hillsboro, OR (US);
Jun Qian, Sherwood, OR (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/45527 (2013.01); C23C 16/45542 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01);
Abstract
Methods and apparatuses for depositing approximately equal thicknesses of a material on at least two substrates concurrently processed in separate stations of a multi-station deposition apparatus are provided.
Karim, Ishtak. (2024). Variable cycle and time rf activation method for film thickness matching in a multi-station deposition system (U.S. Patent No. 12077859). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12077859
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile