The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Apr. 22, 2020
Applicants:

Gigaphoton Inc., Tochigi, JP;

Kyushu University, National University Corporation, Fukuoka, JP;

Inventors:

Osamu Wakabayashi, Oyama, JP;

Hiroshi Ikenoue, Fukuoka, JP;

Hiroaki Oizumi, Oyama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); B23K 26/064 (2014.01); B23K 26/073 (2006.01); B23K 26/08 (2014.01); B23K 26/082 (2014.01); B23K 26/352 (2014.01); C23C 14/18 (2006.01); C23C 14/48 (2006.01); C23C 14/54 (2006.01); G02B 27/14 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01); H01S 3/00 (2006.01); H01L 21/04 (2006.01); H01L 29/16 (2006.01); H01L 29/167 (2006.01); H01S 3/034 (2006.01); H01S 3/038 (2006.01); H01S 3/10 (2006.01); H01S 3/225 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0933 (2013.01); B23K 26/064 (2015.10); B23K 26/0732 (2013.01); B23K 26/082 (2015.10); B23K 26/0876 (2013.01); B23K 26/352 (2015.10); C23C 14/18 (2013.01); C23C 14/48 (2013.01); C23C 14/54 (2013.01); G02B 27/0961 (2013.01); G02B 27/0966 (2013.01); G02B 27/14 (2013.01); H01L 21/67115 (2013.01); H01S 3/005 (2013.01); H01L 21/0455 (2013.01); H01L 29/1608 (2013.01); H01L 29/167 (2013.01); H01S 3/034 (2013.01); H01S 3/038 (2013.01); H01S 3/10069 (2013.01); H01S 3/225 (2013.01);
Abstract

A laser radiation optical system for laser doping and post-annealing, the laser radiation system including A. a laser apparatus configured to generate pulsed laser light that belongs to an ultraviolet region, B. a stage configured to move a radiation receiving object in an at least one scan direction, the radiation receiving object being an impurity source film containing at least an impurity element as a dopant and formed on a semiconductor substrate, and C. an optical system including a beam homogenizer configured to shape the beam shape of the pulsed laser light into a rectangular shape and generate a beam for laser doping and a beam for post-annealing that differ from each other in terms of a first beam width in the scan direction but have the same second beam width perpendicular to the scan direction.


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