The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Feb. 04, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Kaushik Sah, Milpitas, CA (US);

Andrew James Cross, Cheshire, GB;

Sandip Halder, Milpitas, CA (US);

Sayantan Das, Milpitas, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G03F 7/702 (2013.01); G03F 7/70625 (2013.01); H01L 21/0274 (2013.01);
Abstract

A characterization system for inspecting or performing metrology on a layer within a semiconductor stack is disclosed. The system includes an imaging sub-system configured to acquire image data from a semiconductor stack including one or more layers. The semiconductor stack includes a metal layer having a thickness between 0.5 and 10 nm deposited on a layer of the semiconductor stack to form a reflective surface on the layer. The system includes a controller. The controller is configured to receive image data of the reflective surface on the layer of the substrate stack and identify one or more defects or one or more structures within the layer based on illumination reflected from the reflective surface.


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