The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Nov. 12, 2020
Applicant:
Showa Denko K.k., Tokyo, JP;
Inventor:
Atsushi Suzuki, Tokyo, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/00 (2006.01); G01N 21/01 (2006.01); G01N 21/25 (2006.01); G01N 21/31 (2006.01); G01N 21/33 (2006.01);
U.S. Cl.
CPC ...
G01N 33/0052 (2013.01); G01N 21/01 (2013.01); G01N 21/255 (2013.01); G01N 21/314 (2013.01); G01N 21/33 (2013.01); G01N 2021/0112 (2013.01);
Abstract
A method for measuring the concentration of fluorine gas, which includes irradiating a halogen fluoride-containing gas with ultraviolet light in which the ratio (W/W) of the maximum value (W) of ultraviolet light intensity in the wavelength region of less than 250 nm with respect to the ultraviolet light intensity (W) at a wavelength of 285 nm is 1/10 or less, and measuring the absorbance at a wavelength of 285 nm to obtain the concentration of fluorine gas contained in the halogen fluoride-containing gas.