The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Sep. 16, 2019
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Chiara Helena Catherina Giammanco MacPherson, Fremont, CA (US);
Eric Pape, Campbell, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/02 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); C23C 16/0245 (2013.01); C23C 16/4404 (2013.01); C23C 16/45557 (2013.01); H01L 21/02046 (2013.01); H01L 21/02315 (2013.01); H01L 21/6833 (2013.01);
Abstract
A method for conditioning a plasma processing chamber including a chuck is provided. The method comprises a plurality of cycles, wherein each cycle comprises cleaning an interior of the plasma processing chamber and the chuck and forming a silicon oxide based coating on the interior of the plasma processing chamber and the chuck. The silicon oxide based coating has a first layer and a second layer.