The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Sep. 29, 2021
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

James Hamzik, North Billerica, MA (US);

Justin Brewster, North Billerica, MA (US);

Siddarth Sampath, Tyngsboro, MA (US);

Jad Ali Jaber, Westford, MA (US);

Aabid A. Mir, Bedford, MA (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 71/26 (2006.01); B01D 67/00 (2006.01);
U.S. Cl.
CPC ...
B01D 71/261 (2022.08); B01D 67/0093 (2013.01); B01D 2257/60 (2013.01);
Abstract

The disclosure is directed to removal of metal contaminants from fluids, as well as ligand-modified filter materials useful for carrying out such methods. The filters and methods of this disclosure are particularly effective for removal of metals from liquid compositions comprising amines. Such liquid compositions with significantly reduced amounts of metals can be used in a microelectronic manufacturing process, such as liquids for removing photoresist or liquids used in etching. The ligand-modified filters, such as ligand-modified porous membranes, can be configured for use in a microelectronic manufacturing system, which can be utilized in the system as a point of use metal-removal feature for liquids entering the system.


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