The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Jan. 11, 2022
Applicant:
Carl Zeiss Multisem Gmbh, Oberkochen, DE;
Inventors:
Hans Fritz, Grabs, CH;
Ingo Mueller, Aalen, DE;
Assignee:
Carl Zeiss MultiSEM GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/10 (2006.01); H01J 37/145 (2006.01); H01J 37/147 (2006.01); H01J 37/26 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/10 (2013.01); H01J 37/145 (2013.01); H01J 37/147 (2013.01); H01J 37/263 (2013.01); H01J 37/3023 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/04926 (2013.01);
Abstract
A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.