The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Oct. 07, 2021
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Dmitry Klochkov, Schwaebisch Gmuend, DE;
Chuong Huynh, Quincy, MA (US);
Thomas Korb, Schwaebisch Gmuend, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G05B 15/02 (2006.01); G06T 7/13 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G05B 15/02 (2013.01); G06T 7/13 (2017.01); G06T 2207/10072 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A dual-beam device, such as, a scanning electron microscope combined with a focused-ion beam milling column, is employed for a slice-in-image process. Based on one or more images of at least one cross-section of a test volume of a wafer, a wafer tilt is determined.