The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

Mar. 25, 2022
Applicant:

Abberior Instruments Gmbh, Goettingen, DE;

Inventors:

Roman Schmidt, Goettingen, DE;

Benjamin Harke, Goettingen, DE;

Matthias Reuss, Goettingen, DE;

Lars Kastrup, Goettingen, DE;

Assignee:

ABBERIOR INSTRUMENTS GMBH, Goettingen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/58 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G02B 27/58 (2013.01); G02B 21/0072 (2013.01); G02B 21/0076 (2013.01); G02B 21/008 (2013.01);
Abstract

The present specification relates to a method for light microscopic examination of a sample (), in particular by means of laser scanning or MINFLUX microscopy, in which a drift of the sample () or of an object in a sample () with respect to the light microscope () is detected and, if necessary, corrected. In particular, the present specification relates to a corresponding method for examining the sample () using laser scanning or MINFLUX microscopy. For this purpose, reference markers () are located in the sample, the position of which is repeatedly determined according to the MINFLUX principle in order to determine the drift.


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