The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

May. 07, 2020
Applicant:

Cambridge Gan Devices Limited, Cambourne, GB;

Inventors:

Florin Udrea, Cambridge, GB;

Loizos Efthymiou, Cambridge, GB;

Giorgia Longobardi, Cambridge, GB;

Martin Arnold, Cambridge, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 21/02 (2006.01); H01L 27/02 (2006.01); H01L 27/06 (2006.01); H01L 27/088 (2006.01); H01L 27/095 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/66 (2006.01); H03K 17/082 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7786 (2013.01); H01L 21/0254 (2013.01); H01L 27/0248 (2013.01); H01L 27/0605 (2013.01); H01L 27/0629 (2013.01); H01L 27/0883 (2013.01); H01L 27/095 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/66462 (2013.01); H03K 17/0822 (2013.01); H03K 2217/0027 (2013.01);
Abstract

We disclose a Ill-nitride semiconductor based heterojunction power device, comprising: a first heterojunction transistor () formed on a substrate, the first heterojunction transistor comprising: a first Ill-nitride semiconductor region formed over the substrate, wherein the first Ill-nitride semiconductor region comprises a first heterojunction comprising at least one two dimensional carrier gas of second conductivity type; a first terminal () operatively connected to the first Ill-nitride semiconductor region; a second terminal () laterally spaced from the first terminal and operatively connected to the first Ill-nitride semiconductor region; a first gate terminal () formed over the first Ill-nitride semiconductor region between the first terminal and the second terminal. The device also includes a second heterojunction transistor () formed on a substrate, the second heterojunction transistor comprising: a second Ill-nitride semiconductor region formed over the substrate, wherein the second Ill-nitride semiconductor region comprises a second heterojunction comprising at least one two dimensional carrier gas of second conductivity type; a third terminal operatively connected to the second Ill-nitride semiconductor region; a fourth terminal laterally spaced from the third terminal in a first dimension and operatively connected to the second Ill-nitride semiconductor region, wherein the fourth terminal is operatively connected to the first gate terminal; and a second gate terminal formed over the second Ill-nitride semiconductor region between the third terminal and the fourth terminal and wherein the second heterojunction transistor is used in sensing and protection functions of the first power heterojunction transistor. The device also includes at least one monolithically integrated current sensing transistor () that has a substantially identical structure to the first heterojunction transistor, and wherein the third transistor is scaled to a smaller area or a shorter gate width when compared to the first heterojunction transistor by a scale factor, X, where X is larger than 1. Other embodiments include both internal and external sensing, sensing loads and a feedback circuit to provide overcurrent, gate over-voltage or over-temperature protection.


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