Film formation apparatus and moisture removal method thereof

Abstract

According to one embodiment, a film formation apparatus and a moisture removing method thereof that can facilitate the removement of moisture in the chamber without the complication of the apparatus are provided. The film formation apparatus according to the present embodiment includes the chamberwhich an interior thereof can be made vacuum, the exhausterthat exhausts the interior of the chamber, the carrierthat circularly carries the workpiece W by a rotation tableprovided inside the chamber, and the plurality of the plasma processorthat performs plasma processing on the workpiece W which is circularly carried, in which the plurality of the plasma processoreach has the processing spacesandto perform the plasma processing, at least one of the plurality of the plasma processoris the film formation processorthat performs film formation processing by sputtering on the workpiece W which is circularly carried, and at least one of the plurality of the plasma processoris the heaterthat removes moisture in the chamberby producing plasma and heating the interior of the chambervia the rotation tabletogether with exhaustion by the exhausterand rotation by the rotation tablein a condition the film formation process by the film formation processoris not performed.