The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Oct. 31, 2017
Applicant:
Orbotech Ltd., Yavne, IL;
Inventors:
Assignee:
ORBOTECH LTD., Yavne, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/00 (2017.01); B29C 64/10 (2017.01); B29C 64/147 (2017.01); B29C 64/176 (2017.01); B29C 64/182 (2017.01); B29C 64/20 (2017.01); B29C 64/205 (2017.01); B29C 64/218 (2017.01); B29C 64/223 (2017.01); B29C 64/227 (2017.01); B29C 64/245 (2017.01); B29C 64/25 (2017.01); B29C 64/255 (2017.01); B29C 64/268 (2017.01); B29C 64/295 (2017.01); B29C 64/30 (2017.01); B29C 64/307 (2017.01); B29C 64/40 (2017.01); B29C 67/00 (2017.01); B33Y 40/00 (2020.01); B33Y 40/10 (2020.01); B33Y 40/20 (2020.01); B33Y 50/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); B33Y 99/00 (2015.01); B22F 10/22 (2021.01); B22F 12/63 (2021.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/147 (2017.08); B29C 64/00 (2017.08); B29C 64/10 (2017.08); B29C 64/176 (2017.08); B29C 64/182 (2017.08); B29C 64/20 (2017.08); B29C 64/205 (2017.08); B29C 64/218 (2017.08); B29C 64/223 (2017.08); B29C 64/227 (2017.08); B29C 64/245 (2017.08); B29C 64/25 (2017.08); B29C 64/255 (2017.08); B29C 64/268 (2017.08); B29C 64/295 (2017.08); B29C 64/30 (2017.08); B29C 64/307 (2017.08); B29C 64/40 (2017.08); B29C 67/00 (2013.01); B33Y 40/00 (2014.12); B33Y 40/10 (2020.01); B33Y 40/20 (2020.01); B33Y 50/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); B33Y 99/00 (2014.12); B22F 10/22 (2021.01); B22F 12/63 (2021.01); B22F 2999/00 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); Y02P 10/25 (2015.11);
Abstract
A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.