The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2024

Filed:

Jul. 08, 2021
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Tobias Hegele, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H02G 3/04 (2006.01); H02G 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70991 (2013.01); G03F 7/70841 (2013.01); G03F 7/709 (2013.01); H02G 3/0468 (2013.01); H02G 11/00 (2013.01);
Abstract

A protective apparatus for lines between two components of a projection exposure apparatus for semiconductor lithography is firmly connected to the two components. the protective apparatus includes first and second partial regions which are configured to protect against mechanical damage to the lines. The first partial region is at least temporarily configured to mechanically decouple the first component from the second component.


Find Patent Forward Citations

Hegele, Tobias. (2024). Protection device for lines in a projection printing installation for semiconductor lithography (U.S. Patent No. 12038695). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12038695

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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