The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

May. 19, 2022
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takayuki Waseda, Toyama, JP;

Takashi Nakagawa, Toyama, JP;

Kimihiko Nakatani, Toyama, JP;

Motomu Degai, Toyama, JP;

Yoshitomo Hashimoto, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/02 (2006.01); C23C 16/34 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02312 (2013.01); C23C 16/0227 (2013.01); C23C 16/345 (2013.01); C23C 16/4584 (2013.01); H01L 21/0217 (2013.01); H01L 21/02238 (2013.01); H01L 21/02359 (2013.01); H01L 21/0228 (2013.01);
Abstract

There is method of processing a substrate comprising: (a) providing the substrate with a first base containing no oxygen, a second base containing oxygen, and a third base containing no oxygen and no nitrogen on its surface, wherein a protective film is formed on a surface of the third base; (b) modifying a surface of the second base to be fluorine-terminated by supplying a fluorine-containing gas to the substrate in a state where the protective film is formed on the surface of the third base; and (c) forming a film on a surface of the first base by supplying a film-forming gas to the substrate in a state where the surface of the second base is modified.


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