The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
May. 11, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Edo Maria Hulsebos, Bergeijk, NL;
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7092 (2013.01); G03F 9/7076 (2013.01); G03F 7/70625 (2013.01);
Abstract
A method of, and associated apparatuses for, performing a position measurement on an alignment mark including at least a first periodic structure having a direction of periodicity along a first direction. The method includes obtaining signal data relating to the position measurement and fitting the signal data to determine a position value. The fitting uses one of a modulation fit or a background envelope periodic fit.
Hulsebos, Edo. (2024). Alignment method and associated alignment and lithographic apparatuses (U.S. Patent No. 12032305). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12032305
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile