The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

Nov. 21, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Ling Chi Hwang, Hachioji, JP;

Makoto Igarashi, Fuchu, JP;

Aurelie Kuroda, Chofu, JP;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/36 (2006.01); C23C 16/04 (2006.01); C23C 16/34 (2006.01); C23C 16/513 (2006.01);
U.S. Cl.
CPC ...
C23C 16/045 (2013.01); C23C 16/347 (2013.01); C23C 16/513 (2013.01);
Abstract

A method and system for forming a conformal silicon carbon nitride layer overlying a gap on a surface of a substrate are disclosed. Exemplary methods include forming conformal silicon carbon nitride material within the gap and treating the conformal silicon carbon nitride material to form treated silicon carbon nitride material. The deposition time is relatively short to mitigate flow of the conformal silicon carbon nitride material within the gap.


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