The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Sep. 27, 2019
Mitsubishi Electric Corporation, Tokyo, JP;
Munetaka Noguchi, Tokyo, JP;
MITSUBISHI ELECTRIC CORPORATION, Tokyo, JP;
Abstract
A silicon carbide semiconductor device includes a drift layer of n-type formed on a semiconductor substrate composed of silicon carbide, a well region of p-type formed on a surface portion of the drift layer, a source region of p-type formed on a surface portion of the well region, a gate insulating film formed in contact with the source region, the well region, and the drift layer, and a gate electrode formed on the gate insulating film. In the silicon carbide semiconductor device, oxygen is contained in a region having a predetermined thickness from an interface between the well region and the gate insulating film toward the well regions side.