The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
Mar. 09, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Atsushi Yamashita, Kumamoto, JP;
Koji Kagawa, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); F26B 5/00 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); B08B 3/08 (2013.01); B08B 13/00 (2013.01); F26B 5/005 (2013.01); H01L 21/0206 (2013.01); B08B 2203/007 (2013.01); H01L 21/02189 (2013.01); H01L 21/02282 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01);
Abstract
A substrate processing method includes: a preparing process of preparing a substrate in which a zirconium oxide film as a mask has been formed on a laminated film and dry-etched into a given shape; after the preparing process, a mask removing process of removing the zirconium oxide film by supplying a mask removing liquid containing sulfuric acid as a main component to the substrate; and after the mask removing process, a drying process of drying a surface of the substrate that is wet with a rinsing liquid.