logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12020943 B1

PDFFull Text
Date of Patent:
Jun. 25, 2024

Filed:

Mar. 09, 2022

Substrate processing method and substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Atsushi Yamashita, Kumamoto, JP;

Koji Kagawa, Kumamoto, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Erin F Bergner

Int. Cl.
CPC ...
H01L 21/311 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); F26B 5/00 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); B08B 3/08 (2013.01); B08B 13/00 (2013.01); F26B 5/005 (2013.01); H01L 21/0206 (2013.01); B08B 2203/007 (2013.01); H01L 21/02189 (2013.01); H01L 21/02282 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01);
Abstract

A substrate processing method includes: a preparing process of preparing a substrate in which a zirconium oxide film as a mask has been formed on a laminated film and dry-etched into a given shape; after the preparing process, a mask removing process of removing the zirconium oxide film by supplying a mask removing liquid containing sulfuric acid as a main component to the substrate; and after the mask removing process, a drying process of drying a surface of the substrate that is wet with a rinsing liquid.

Find Patent Forward Citations

Quick Actions:

Yamashita, Atsushi. (2024). Substrate processing method and substrate processing apparatus (U.S. Patent No. 12020943). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12020943

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…