The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Jun. 24, 2021
Applicant:
Changxin Memory Technologies, Inc., Anhui, CN;
Inventor:
Shuai Guo, Hefei, CN;
Assignee:
CHANGXIN MEMORY TECHNOLOGIES, INC., Anhui, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/544 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); H01L 21/0332 (2013.01); H01L 21/31144 (2013.01); H01L 2223/54426 (2013.01);
Abstract
The method for forming overlay marks includes: providing a substrate, a surface of the substrate having a mark layer and a first mask layer; forming first trenches and second trenches in the first mask layer; forming a spacer layer covering side walls of the first trenches and side walls of the second trenches; backfilling the first trenches and the second trenches; removing the spacer layer; and etching the mark layer and forming main overlay marks and dummy overlay marks.