The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Aug. 07, 2019
Tokyo Electron Limited, Tokyo, JP;
Mitsuhiro Iwano, Miyagi, JP;
Masanori Hosoya, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
In an etching method, plasma from a processing gas containing a fluorocarbon gas is formed within a chamber of a plasma processing apparatus, and a deposit containing fluorocarbon is formed on a substrate. The substrate includes a first region formed of a silicon containing material and a second region formed of a metal containing material. Subsequently, plasma from a rare gas is formed within the chamber, and rare gas ions are supplied to the substrate. As a result, the first region is etched by the fluorocarbon contained in the deposit. When the plasma from the rare gas is formed, a magnetic field distribution in which a horizontal component on an edge side of the substrate is higher than a horizontal component on a center of the substrate is formed by an electromagnet.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile