The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Apr. 25, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kelvin Chan, San Ramon, CA (US);

Yang Guo, Fremont, CA (US);

Ashish Goel, Sunnyvale, CA (US);

Anantha Subramani, San Jose, CA (US);

Philip Allan Kraus, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/34 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 28/04 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4402 (2013.01); C23C 14/34 (2013.01); C23C 16/402 (2013.01); C23C 16/405 (2013.01); C23C 16/4409 (2013.01); C23C 28/042 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 37/32871 (2013.01); H01L 21/02164 (2013.01); H01L 21/02271 (2013.01); H01L 21/28568 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/3321 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01);
Abstract

Embodiments include a processing tool for processing substrates in a low processing pressure and a high processing pressure. In an embodiment, the processing tool comprises a chamber body and a pedestal in the chamber body. In an embodiment, the pedestal is displaceable, and the pedestal has a first surface and a second surface opposite the first surface. In an embodiment, the processing tool further comprises a first gas port for supplying gasses into the chamber body and a first exhaust positioned above the first surface of the pedestal. In an embodiment, the embodiment further comprises a second gas port for supplying gasses into the chamber body and a second exhaust positioned below the second surface of the pedestal.


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