The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Jun. 14, 2021
Applicant:

Sang-yun Lee, Hillsboro, OR (US);

Inventor:

Sang-Yun Lee, Hillsboro, OR (US);

Assignee:

BeSang, Inc., Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/40 (2023.01); G11C 5/06 (2006.01); H01L 23/48 (2006.01); H01L 23/535 (2006.01); H10B 41/20 (2023.01); H10B 41/30 (2023.01); H10B 41/40 (2023.01); H10B 41/41 (2023.01); H10B 43/20 (2023.01); H10B 43/30 (2023.01);
U.S. Cl.
CPC ...
H10B 43/40 (2023.02); G11C 5/063 (2013.01); H01L 23/481 (2013.01); H01L 23/535 (2013.01); H10B 41/20 (2023.02); H10B 41/30 (2023.02); H10B 41/40 (2023.02); H10B 41/41 (2023.02); H10B 43/20 (2023.02); H10B 43/30 (2023.02);
Abstract

Disclosed are novel structures and methods for 3D NVM built with vertical transistors above a logic layer. A first embodiment has a conductive film under the transistors and serving as a common node in a memory block. The conductive film may be from a semiconductor layer used to build the transistors. Metal lines are disposed above the transistors for connection through 3D vias to underlying circuitry. Contact plugs may be formed between transistors and metal lines. The conductive film may be coupled to underlying circuitry through contacts on the conductive film or through interconnect vias underneath the film. A second embodiment has conductive lines disposed under the transistors. Either of conductive lines and metal lines may serve as source lines and the other as bit lines for the memory. For low parasitic resistances, the conductive lines may be shorted to bypass metal lines residing in underlying logic layer.


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