The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Mar. 27, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chun-Yao Ku, Hsinchu, TW;

Wen-Hao Chen, Hsinchu, TW;

Kuan-Ting Chen, Hsinchu, TW;

Ming-Tao Yu, Hsinchu, TW;

Jyun-Hao Chang, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G06F 30/20 (2020.01); G06F 30/392 (2020.01); H01L 23/538 (2006.01); H01L 27/02 (2006.01); H10K 30/83 (2023.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G06F 30/20 (2020.01); G06F 30/392 (2020.01); H01L 23/5386 (2013.01); H01L 23/5387 (2013.01); H10K 30/83 (2023.02);
Abstract

A method of forming an integrated circuit includes placing a first and a second standard cell layout design of the integrated circuit on a layout design, and manufacturing the integrated circuit based on at least the first or second standard cell layout design. The first standard cell layout design has a first height. The second standard cell layout design has a second height. Placing the first standard cell layout design includes placing a first set of pin layout patterns on a first layout level over a first set of gridlines, extending in a first direction, and having a first width in a second direction. Placing the second standard cell layout design includes placing a second set of pin layout patterns on the first layout level over a second set of gridlines, extending in the first direction, and having a second width in the second direction.


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