The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Jan. 08, 2020
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Christopher Daniel Manack, Flower Mound, TX (US);

Qiao Chen, Flower Mound, TX (US);

Michael Todd Wyant, Dallas, TX (US);

Matthew John Sherbin, Dallas, TX (US);

Patrick Francis Thompson, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 23/585 (2013.01); H01L 23/528 (2013.01); H01L 23/53209 (2013.01);
Abstract

An integrated circuit (IC) die includes a substrate with circuitry configured for at least one function including metal interconnect levels thereon including a top metal interconnect level and a bottom metal interconnect level, with a passivation layer on the top metal interconnect level. A scribe street is around a periphery of the IC die, the scribe street including a scribe seal utilizing at least two of the plurality of metal interconnect levels, an inner metal meander stop ring including at least the top metal interconnect level located outside the scribe seal, wherein the scribe seal and the inner metal meander stop ring are separated by a first separation gap. An outer metal meander stop ring including at least the top metal interconnect level is located outside the inner metal stop ring, wherein the outer stop ring and the inner stop ring are separated by a second separation gap.


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