The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Feb. 23, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Kuang-Hung Chang, Hsinchu, TW;

Yuan-Te Hou, Hsinchu, TW;

Chung-Hsing Wang, Hsinchu County, TW;

Yung-Chin Hou, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); G06F 30/20 (2020.01); G06F 30/327 (2020.01); G06F 30/337 (2020.01); G06F 30/373 (2020.01); G06F 30/392 (2020.01); G06F 30/394 (2020.01); G06F 30/398 (2020.01); H01L 27/00 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/20 (2020.01); G06F 30/327 (2020.01); G06F 30/394 (2020.01); H01L 23/528 (2013.01); H01L 27/0886 (2013.01); G06F 30/337 (2020.01); G06F 30/373 (2020.01); G06F 30/398 (2020.01);
Abstract

An IC structure includes first, second, third, and fourth transistors on a substrate, a first net and a second net. The first net includes a plurality of first metal lines routed on a first metallization layer, and a plurality of first metal vias electrically connecting the plurality of first metal lines to the first and second transistors. The second net includes a plurality of second metal lines routed on a second metallization layer, and a plurality of second metal vias electrically connecting the plurality of second metal lines to the third and fourth transistors. A count of the first metal vias of the first net is less than a count of the second metal vias of the second net, and a line height of the first metal line of the first net is greater than a line height of the second metal line of the second net.


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