The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2024

Filed:

Oct. 23, 2018
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Makoto Kashiwagi, Tokyo, JP;

Manao Hoshina, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); B24B 37/10 (2012.01); B24B 41/06 (2012.01); G03F 7/00 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68764 (2013.01); B24B 37/105 (2013.01); B24B 41/067 (2013.01); G03F 7/707 (2013.01); G03F 7/70758 (2013.01); H01L 21/67706 (2013.01); H01L 21/68728 (2013.01); H01L 21/68792 (2013.01);
Abstract

A substrate holding apparatus which can enhance the efficiency of processing of a substrate, such as a wafer, is disclosed. The substrate holding apparatus for holding a substrate and rotating the substrate, includes: rollers capable of contacting a periphery of the substrate; a roller rotating mechanism configured to rotate the rollers; and eccentric shafts coupling the rollers and the roller rotating mechanism, the eccentric shafts having first shaft portions and second shaft portions, the second shaft portions being eccentric relative to the first shaft portions, the first shaft portions being secured to the roller rotating mechanism, and the rollers being secured to the second shaft portions, respectively.


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