The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
Jul. 21, 2021
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Tomomi Watanabe, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 43/29 (2006.01); C07C 43/295 (2006.01); C07C 53/15 (2006.01); C07C 59/115 (2006.01); C07C 63/70 (2006.01); C07C 65/05 (2006.01); C07C 69/63 (2006.01); C07C 205/58 (2006.01); C07C 229/60 (2006.01); C07C 311/09 (2006.01); C07D 205/04 (2006.01); C07D 295/13 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 220/30 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 43/29 (2013.01); C07C 43/295 (2013.01); C07C 53/15 (2013.01); C07C 59/115 (2013.01); C07C 63/70 (2013.01); C07C 65/05 (2013.01); C07C 69/63 (2013.01); C07C 205/58 (2013.01); C07C 229/60 (2013.01); C07C 311/09 (2013.01); C07D 205/04 (2013.01); C07D 295/13 (2013.01); C08F 220/1804 (2020.02); C08F 220/22 (2013.01); C08F 220/30 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract
A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.