The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
May. 25, 2020
Topcon Corporation, Tokyo, JP;
Riken, Saitama, JP;
Homare Momiyama, Tokyo, JP;
Yoshiaki Sasaki, Miyagi, JP;
Isao Yoshimine, Miyagi, JP;
Chiko Otani, Miyagi, JP;
Tetsuya Yuasa, Yamagata, JP;
TOPCON CORPORATION, Tokyo, JP;
RIKEN, Saitama, JP;
Abstract
Provided is an optical interference measuring apparatus including a measuring unit for acquiring an interferogram of an interference wave obtained by irradiating a measuring target and a reference surface with electromagnetic waves and causing reflected waves from a reflecting surface of the measurement target and reflected waves from the reference surface to interfere and a signal processing unit for configuring an intensity profile in the depth direction by performing Fourier transform of the interferogram. The signal processing unit is configured to estimate a parameter for a model formula for an assumed surface count, based on the model formula of an interferogram when it is assumed that the measurement target has a predetermined structure, to select an optimal model by a statistical technique from the model formula to which a parameter estimated for the assumed surface count is applied, and to reconfigure an intensity profile based on the optimal model.