The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Apr. 24, 2020
Applicant:
Advanced Micro Foundry Pte. Ltd, Singapore, SG;
Inventors:
Patrick Guo Qiang Lo, Singapore, SG;
Shawn Yohanes Siew, Singapore, SG;
Larry Lian Xi Jia, Singapore, SG;
Assignee:
ADVANCED MICRO FOUNDRY PTE. LTD., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/035 (2006.01); G02B 6/12 (2006.01); G02F 1/025 (2006.01); G02F 1/225 (2006.01); G02F 1/355 (2006.01);
U.S. Cl.
CPC ...
G02F 1/035 (2013.01); G02B 6/12 (2013.01); G02F 1/025 (2013.01); G02F 1/225 (2013.01); G02B 2006/1204 (2013.01); G02B 2006/12047 (2013.01); G02B 2006/12097 (2013.01); G02B 2006/12142 (2013.01); G02B 2006/12176 (2013.01); G02F 1/3553 (2013.01); G02F 2201/063 (2013.01);
Abstract
A hybrid photonic chip comprising a plurality of semiconductor materials arranged to define a chip providing a function, wherein at least a first part of the chip is formed of materials which can be fabricated using a CMOS technique; and at least a second part of the chip which comprises non-linear crystal material and is not subjected to etching process; wherein the second part of the chip in conjunction with the first part is configured to support a propagating low loss single mode.