The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Oct. 26, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Samantha S. H. Tan, Newark, CA (US);
Jun Xue, San Jose, CA (US);
Mary Anne Manumpil, Northridge, CA (US);
Jengyi Yu, San Ramon, CA (US);
Da Li, Newark, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C23C 16/04 (2006.01); G03F 1/22 (2012.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); C23C 16/047 (2013.01); G03F 1/22 (2013.01); G03F 7/091 (2013.01); G03F 7/167 (2013.01); G03F 7/2004 (2013.01); G03F 7/70033 (2013.01); H01L 21/02274 (2013.01); H01L 21/0274 (2013.01); H01L 21/0332 (2013.01);
Abstract
This disclosure relates generally to a patterning structure including an underlayer and an imaging layer, as well as methods and apparatuses thereof. In particular embodiments, the underlayer provides an increase in radiation absorptivity and/or patterning performance of the imaging layer.