The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2024

Filed:

Jul. 30, 2019
Applicant:

Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;

Inventors:

Patrick-Jeremy Dahan, Grenoble, FR;

Renaud Varache, Grenoble, FR;

Wilfried Favre, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 21/6489 (2013.01); G01N 21/6456 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G06T 7/001 (2013.01); G06T 2207/20021 (2013.01); G06T 2207/20212 (2013.01); G06T 2207/30148 (2013.01); H01L 22/12 (2013.01);
Abstract

A method of analysis of defects of a type from among a plurality of types of defects between two samples based on an image of each sample characteristic of a type of defect from among the plurality of types of defects includes: for each sample, creating a minimap including bins and representative of a type of defect whose resolution is less than the image of the sample, each bin of the minimap being associated with pixels of the image of the sample and having a score dependent on the pixels and representative of the quantity of a type of defects; determining the distance between each minimap representing the same type or types of defects, the distance between two minimaps being defined as the minimum distance between two minimaps by considering the following transformations: a rotation and/or a symmetry so that each distance between two minimaps is associated with a transformation.


Find Patent Forward Citations

Dahan, Patrick-Jeremy. (2024). Analysis of defects of at least one type from among a plurality of types of defects between at least two samples (U.S. Patent No. 11982623). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11982623

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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