The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Mar. 15, 2021
Applicant:

Disco Corporation, Tokyo, JP;

Inventor:

Keiji Nomaru, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/03 (2006.01); B23K 26/08 (2014.01); B23K 26/00 (2014.01); B23K 26/064 (2014.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
B23K 26/034 (2013.01); B23K 26/009 (2013.01); B23K 26/064 (2015.10); B23K 26/0853 (2013.01); B23K 2101/40 (2018.08);
Abstract

A detection mechanism of a detection device includes a pulsed laser oscillator that emits a pulsed laser beam; an fθ lens facing a workpiece held by a chuck table; a thermal excitation section that applies the pulsed laser beam emitted from the pulsed laser oscillator to an upper surface of a wafer through the fθ lens and generates an ultrasonic wave propagated in a spherical form by thermal excitation; and an image forming section that forms an image by capturing a reflected laser beam influenced by vibration of the ultrasonic wave generated by the thermal excitation section, propagated through the inside of the workpiece, reflected by a lower surface of the workpiece, and returned to the upper surface of the workpiece, by an aperture synthesis method.


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