The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2024

Filed:

Mar. 30, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Myungjun Lee, Seongnam-si, KR;

Wookrae Kim, Suwon-si, KR;

Jaehwang Jung, Hwaseong-si, KR;

Myoungki Ahn, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G01N 21/21 (2006.01); G01N 21/95 (2006.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01); G01N 21/17 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67288 (2013.01); G01N 21/211 (2013.01); G01N 21/9501 (2013.01); G06T 7/001 (2013.01); H01L 22/12 (2013.01); G01N 2021/1765 (2013.01); G01N 2201/12 (2013.01); G01N 2201/13 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.


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