The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Aug. 19, 2021
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Xiaoguang Wang, Hefei, CN;

Yiming Zhu, Hefei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H10B 12/00 (2023.01); H10B 53/00 (2023.01); H10B 61/00 (2023.01); H10B 63/00 (2023.01);
U.S. Cl.
CPC ...
H01L 21/823412 (2013.01); H01L 27/088 (2013.01); H01L 29/401 (2013.01); H01L 29/4236 (2013.01); H10B 12/00 (2023.02); H10B 53/00 (2023.02); H10B 61/22 (2023.02); H10B 63/30 (2023.02);
Abstract

The present application relates to a semiconductor structure and its forming method. The semiconductor structure comprises a substrate; a first transistor that includes a first channel disposed within the substrate, and a first end disposed at surface of the substrate, the first end being adapted to connect with a first-type storage cell; a second transistor that includes a second channel disposed within the substrate, and a second end disposed at surface of the substrate, the second end being adapted to connect with a second-type storage cell, the second channel having a length greater than length of the first channel. The present application enables fabrication techniques of the first transistor and the second transistor compatible. Moreover, the present application is conducive to enhancing integration density of the storage cells of the first transistor and/or the second transistor in the memory lays foundation for enlarging the fields of application of the memory.


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