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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11967511 B1

PDFFull Text
Date of Patent:
Apr. 23, 2024

Filed:

Jun. 28, 2022

Plasma processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Akira Ishikawa, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Jeffrie R Lund

Assistant Examiner:

Tiffany Z Nuckols

Int. Cl.
CPC ...
H01L 21/687 (2006.01); C23C 16/458 (2006.01); H01J 37/20 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67109 (2013.01); C23C 16/4586 (2013.01); H01J 37/20 (2013.01); H01L 21/3065 (2013.01); H01L 21/67063 (2013.01); H01L 21/6833 (2013.01); H01L 21/6838 (2013.01); H01L 21/68785 (2013.01);
Abstract

Temperature uniformity in a mounting surface of a mounting table is improved. A plasma processing apparatus includes a mounting table having thereon a mounting surface on which a work-piece serving as a plasma processing target is mounted; a coolant path formed within the mounting table along the mounting surface of the mounting table; an inlet path connected to the coolant path from a backside of the mounting surface of the mounting table and configured to introduce a coolant into the coolant path; and a thermal resistor provided in a region, facing a connection portion between the inlet path and the coolant path, of an inner wall of the coolant path.

Find Patent Forward Citations

Ishikawa, Akira. (2024). Plasma processing apparatus (U.S. Patent No. 11967511). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11967511

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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