The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Mar. 09, 2020
Asml Netherlands B.v., Veldhoven, NL;
Abhiram Lakshmi Ganesh Govindaraju, San Diego, CA (US);
David Bessems, San Diego, CA (US);
Sandeep Rai, Corona, CA (US);
Petrus Adrianus Willems, Eindhoven, NL;
Serkan Kincal, San Diego, CA (US);
Joshua Mark Lukens, San Diego, CA (US);
Jon David Tedrow, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.