The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Apr. 15, 2022
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventor:

Shesh Mani Pandey, Saratoga Springs, NY (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/735 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/735 (2013.01); H01L 29/0808 (2013.01); H01L 29/0821 (2013.01); H01L 29/1008 (2013.01); H01L 29/6625 (2013.01);
Abstract

The disclosure provides a bipolar transistor structure with multiple bases, and related methods. A bipolar transistor structure includes a first emitter/collector (E/C) material above an insulator. The first E/C material has first sidewall and a second sidewall over the insulator. A first base is above the insulator adjacent the first sidewall of the first E/C material. A second base is above the insulator adjacent the second sidewall of the first E/C material. A second E/C material is above the insulator and adjacent the first base. A width of the first base between the first E/C material and the second E/C material is less than a width of the first E/C material, and the first base protrudes horizontally outward from an end of the first E/C material and an end of the second E/C material.


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