The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Aug. 26, 2021
Applicant:

Changxin Memory Technologies, Inc., Anhui, CN;

Inventor:

Lingxiang Wang, Hefei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); H01L 23/522 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 28/91 (2013.01); H01L 28/92 (2013.01); H10B 12/00 (2023.02);
Abstract

A method for forming a semiconductor structure includes providing a semiconductor substrate, which at least includes discrete conducting layers in the semiconductor substrate; forming discretely arranged supporting structures on the semiconductor substrate, capacitor openings being included between the supporting structures; forming lower electrodes on sidewalls of the supporting structures, the lower electrodes being electrically connected with the conducting layers; forming a capacitor dielectric layer covering tops of the supporting structures, sidewalls of the lower electrodes, and bottoms of the capacitor openings; and forming an upper electrode covering the capacitor dielectric layer, to form capacitor structures.


Find Patent Forward Citations

Wang, Lingxiang. (2024). Method for forming semiconductor structure and semiconductor structure (U.S. Patent No. 11961881). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11961881

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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