The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Mar. 25, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Maikel Robert Goosen, Eindhoven, NL;

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Lucas Kuindersma, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G06T 7/00 (2017.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G06T 7/001 (2013.01); H01J 37/28 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20048 (2013.01); G06T 2207/30141 (2013.01); H01J 2237/223 (2013.01); H01J 2237/2817 (2013.01);
Abstract

Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.


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