The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
May. 17, 2023
Unity Semiconductor, Montbonnot-Saint-Martin, FR;
Wolfgang Alexander Iff, Domène, FR;
UNITY SEMICONDUCTOR, Montbonnot-Saint-Martin, FR;
Abstract
A method and system implementing the method for characterising structures etched in a substrate, such as a wafer, includes at least one structure etched in the substrate, an imaging step including the following steps: capturing, with an imaging device positioned on the top surface of the substrate, at least one image of a top surface of the substrate, and measuring a first data relating to the structure from at least one captured image, at least one interferometric measurement step, carried out with a low-coherence interferometer positioned on the top surface, for measuring with a measurement beam positioned on the structure, at least one depth data relating to a depth of the structure; and a first adjusting step for adjusting the measurement beam according to the first data.