The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Jul. 12, 2023
Applicant:
Harris Membrane Clean Technology Inc., Alhambra, CA (US);
Inventors:
Assignee:
HARRIS MEMBRANE CLEAN TECHNOLOGY INC., Alhambra, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 61/02 (2006.01); B01D 61/08 (2006.01); B01D 67/00 (2006.01); B01D 69/02 (2006.01); B01D 69/10 (2006.01); B01D 71/34 (2006.01); B01D 71/68 (2006.01);
U.S. Cl.
CPC ...
B01D 61/027 (2013.01); B01D 61/08 (2013.01); B01D 67/00111 (2022.08); B01D 67/0013 (2013.01); B01D 69/02 (2013.01); B01D 69/105 (2013.01); B01D 69/1071 (2022.08); B01D 71/34 (2013.01); B01D 71/68 (2013.01); B01D 2323/081 (2022.08); B01D 2323/12 (2013.01); B01D 2323/22 (2013.01); B01D 2325/02833 (2022.08); B01D 2325/04 (2013.01); B01D 2325/14 (2013.01); B01D 2325/26 (2013.01);
Abstract
A high-flux composite nanofiltration (NF) membrane with an electrical double layer (EDL) and a preparation method thereof are provided. The high-flux composite NF membrane includes: a charged support membrane and a charged separation layer, where a charge carried by the support membrane or the separation layer is a positive charge, a negative charge, or an amphiprotic charge. The high-flux composite NF membrane with an EDL solves the technical problem that the composite NF membrane in the prior art has an unsatisfactory retention rate and a limited application range due to a small charge quantity.