The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Jun. 05, 2023
Applicant:

Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);

Inventors:

Matthew C. Putman, Brooklyn, NY (US);

John B. Putman, Celebration, FL (US);

Jonathan Lee, Brooklyn, NY (US);

Damas Limoge, Brooklyn, NY (US);

Assignee:

Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/02 (2006.01);
U.S. Cl.
CPC ...
G05B 13/027 (2013.01);
Abstract

A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.


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