The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Jul. 22, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Nitin Pathak, Mumbai, IN;
Yuxing Zhang, San Jose, CA (US);
Tuan A. Nguyen, San Jose, CA (US);
Kalyanjit Ghosh, Pleasanton, CA (US);
Amit Bansal, Milpitas, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.