The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Aug. 18, 2021
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventor:

Katsumi Nakamura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/868 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7397 (2013.01); H01L 29/0696 (2013.01); H01L 29/66333 (2013.01); H01L 29/868 (2013.01);
Abstract

A semiconductor device includes: an Ndrift layer of a first conductivity type formed in the semiconductor substrate; a P base layer formed on the Ndrift layer; and an N buffer layer of the first conductivity type formed under the Ndrift layer and higher in peak impurity concentration than the Ndrift layer. The N buffer layer includes: a first buffer layer in which a trap level derived from lattice defect is not detected by a photoluminescence method; and a second buffer layer provided between the first buffer layer and the Ndrift layer and in which two types of trap levels derived from lattice defect are detected by the photoluminescence method.


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