The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Apr. 20, 2020
Applicant:
Kyocera Corporation, Kyoto, JP;
Inventors:
Assignee:
KYOCERA Corporation, Kyoto, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C01F 17/218 (2020.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); C01F 17/218 (2020.01); C23C 14/083 (2013.01); C23C 14/34 (2013.01); C01P 2002/02 (2013.01); C01P 2002/60 (2013.01); C01P 2002/74 (2013.01); C01P 2002/90 (2013.01); C01P 2006/90 (2013.01);
Abstract
A component for a plasma processing apparatus, and a plasma processing apparatus are highly resistant to plasma and are highly durable. The component includes a substrate containing a first element that is a metal element or a semimetal element, and a film located on the substrate and containing yttrium oxide as a main constituent. The film contains yttrium oxide crystal grains oriented with a deviation angle of ±10° from a {111} direction of a crystal lattice plane of yttrium oxide. The yttrium oxide crystal grains oriented with the deviation angle have an area ratio of 45% or greater.