The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Oct. 28, 2022
Fujifilm Corporation, Tokyo, JP;
Makoto Yonaha, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a damage diagram creation method, a damage diagram creation device, a damage diagram creation system, and a recording medium capable of detecting damage with high accuracy based on a plurality of images acquired by subjecting a subject to split imaging. In a damage diagram creation method, damage of a subject is detected from each image (each image in a state of being not composed) constituting a plurality of images (a plurality of images acquired by subjecting the subject to split imaging), and thus, damage detection performance is not deteriorated due to deterioration of image quality in an overlapping area. Therefore, it is possible to detect damage with high accuracy based on a plurality of images acquired by subjecting the subject to split imaging. Detection results for the respective images can be composed using a composition parameter calculated based on correspondence points between the images.