The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

May. 12, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Rami Khazaka, Leuven, BE;

Qi Xie, Wilsele, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); C30B 29/06 (2006.01); C30B 29/08 (2006.01); C30B 33/12 (2006.01);
U.S. Cl.
CPC ...
C30B 25/10 (2013.01); C30B 29/06 (2013.01); C30B 29/08 (2013.01); C30B 33/12 (2013.01);
Abstract

Methods and devices for epitaxially growing boron doped silicon germanium layers. The layers may be used, for example, as a p-type source and/or drain regions in field effect transistors.


Find Patent Forward Citations

Khazaka, Rami. (2024). Method for depositing boron containing silicon germanium layers (U.S. Patent No. 11946157). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11946157

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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