The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Jan. 27, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sze Chieh Tan, Singapore, SG;
Vicknesh Sahmuganathan, Singapore, SG;
Eswaranand Venkatasubramanian, Santa Clara, CA (US);
Abhijit Basu Mallick, Sunnyvale, CA (US);
John Sudijono, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/27 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C23C 16/279 (2013.01); C23C 16/0227 (2013.01); C23C 16/45536 (2013.01); B82Y 40/00 (2013.01);
Abstract
Methods of depositing a nanocrystalline diamond film are described. The method may be used in the manufacture of integrated circuits. Methods include treating a substrate with a mild plasma to form a treated substrate surface, incubating the treated substrate with a carbon-rich weak plasma to nucleate diamond particles on the treated substrate surface, followed by treating the substrate with a strong plasma to form a nanocrystalline diamond film.