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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11942308 B1

PDFFull Text
Date of Patent:
Mar. 26, 2024

Filed:

Apr. 13, 2021

Microwave plasma source, microwave plasma processing apparatus and plasma processing method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Yasuaki Taniike, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Yuechuan Yu

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/511 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3222 (2013.01); C23C 16/345 (2013.01); C23C 16/45542 (2013.01); C23C 16/45551 (2013.01); C23C 16/4584 (2013.01); C23C 16/511 (2013.01); H01J 37/32311 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01L 22/34 (2013.01);
Abstract

A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperature.

Find Patent Forward Citations

Taniike, Yasuaki. (2024). Microwave plasma source, microwave plasma processing apparatus and plasma processing method (U.S. Patent No. 11942308). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11942308

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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