The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Dec. 06, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Yan Ren, Eindhoven, NL;

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); G01N 23/2251 (2018.01); H01J 37/09 (2006.01); H01J 37/145 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1478 (2013.01); G01N 23/2251 (2013.01); H01J 37/09 (2013.01); H01J 37/145 (2013.01); H01J 37/1474 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); G01N 2223/07 (2013.01); G01N 2223/418 (2013.01); G01N 2223/507 (2013.01); H01J 2237/0455 (2013.01); H01J 2237/04926 (2013.01); H01J 2237/103 (2013.01); H01J 2237/151 (2013.01); H01J 2237/226 (2013.01); H01J 2237/2611 (2013.01);
Abstract

Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.


Find Patent Forward Citations

Ren, Yan. (2024). Systems and methods for real time stereo imaging using multiple electron beams (U.S. Patent No. 11942303). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11942303

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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